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ENHANCING UV LIGHT IN A UV MASK BY UV REFLECTING FLOW CHAMBER

[Category : - HEALTH]
[Viewed 267 times]

The invention relates to a method for enhancing ultraviolet light in an anti-pathogen UV respiratory mask. The UV enhancing method involves at least one ultraviolet light-emitting diode and a flow chamber coated with ultraviolet reflecting materials or fabricated from ultraviolet reflecting materials such as ePTFE (expanded polytetrafluorethylene), Aluminum, in a UV respiratory mask. At least one ultraviolet LED or any miniature-size UV light source, is located inside the UV reflecting chamber such that ultraviolet light is reflected back from the reflecting walls of the flow chamber and bounces back and forth as much as possible. When the ultraviolet light is bouncing back and forth in the reflecting chamber, its intensity increases several times. ePTFE has an ultraviolet reflection coefficient of about 95% and can enhance ultraviolet light 20 times. Aluminum has an ultraviolet reflection coefficient of about 80%, hence can enhance ultraviolet light inside the flow chamber 5 times. Particulate filters such as HEPA filters can be added to the respiratory mask to filter out air suspended particulates as well.

Patent publications:

WO 2023062405

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arahmanineja (Iran)

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